Hydroxypropyl-triazole compounds, their production and their...

Details Hydroxypropyl-triazole compounds, their production and their... Hydroxypropyl-triazole compounds, their production and their...

C - Chemistry, Metallurgy

07

D

260/313

C07D 249/08 (2006.01) C07C 29/40 (2006.01) C07D 521/00 (2006.01)

Patent

CA 1130296

ABSTRACT OF THE DISCLOSURE The invention relates to hydroxypropyl-triazole compounds and methods for their preparation. Also described are compositions containing said hydroxy- propyl-triazoles and methods for the use of the said active compounds and compositions, as antimycotic agents. The new compounds are those of the formula Image (I) or a salt thereof in which Az denotes a triazole radical, R denotes an optionally substituted phenyl, naphthyl or tetrahydro- naphthyl radical R1 denotes an optionally substituted phenyl or cycloalkyl radical and R2 denotes a hydrogen atom, or R1 and R together, in the o-position relative to one another, denote an optionally substituted methylene bridge with more than one member, or, together with the phenyl ring, complete a naphthyl radical, R3 denotes a halogen atom or an alkyl, alkoxy or halogeno-alkyl group and n is 0, 1, 2 or 3.

340546

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