F - Mech Eng,Light,Heat,Weapons – 21 – V
Patent
F - Mech Eng,Light,Heat,Weapons
21
V
240/147
F21V 7/00 (2006.01) F21V 7/08 (2006.01) G09B 9/30 (2006.01)
Patent
CA 1243644
ILLUMINATION SYSTEM REFLECTOR ABSTRACT OF THE DISCLOSURE An illumination system reflector (18) which provides maximum energy to an aperture (25) with high uniformity and at high efficiencies, the reflector (18) being particularly adapted for use in liquid crystal light valve projection systems. A discharge lamp (34) is utilized in conjunction with an elliptical reflector (18), the axis of the reflector between the primary and secondary focus being tilted at an angle (.theta.) to the lamp axis. The axis of the ellipse (22) is displaced from the lamp axis a predetermined amount (DH), the combination of tilt (.theta.) and displacement (DH) being effective to increase illumination uniformity and efficiency at the aperture (25). Other system parameters, such as throw distance (CTHRO) and cone angle (.alpha.) also affect uniformity and efficiency for a typical design in which the parameters are selected to provide an optimized system being disclosed. A computer program simulation may be utilized for parameter selection. The vertical displacement (DH) parameter is shown to be related to the lamp envelope dimensions.
486832
Hughes Aircraft Company
Sim & Mcburney
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