G - Physics – 03 – F
Patent
G - Physics
03
F
96/150, 96/266
G03F 7/032 (2006.01) G03F 7/031 (2006.01)
Patent
CA 1163852
Case 3-13266/ARL 305+ - 1 - IMAGE FORMATION PROCESS ABSTRACT OF THE DISCLOSURE A method for forming an image by a positive resist process comprises (1) exposing imagewise to actinic radiation a photoresist composition comprising (a) a film-forming organic material having at least one substituted benzoin group of formula Image I where R1 denotes a hydrogen atom, an alkyl, cycloalkyl, cycloalkylalkyl, or aralkyl group or a group -(CH2)bX; R2 denotes a hydrogen atom or an alkyl, cycloalkyl, cycloalkylalkyl, aryl or aralkyl group; R3 denotes a halogen atom or an alkyl, alkoxy, cycloalkyl, cycloalkylalkyl or phenyl group; X denotes a halogen atom, an alkoxy group, a phenoxy group, a group -COOR4 or a group -OOCR4, where R4 denotes an alkyl group; a denotes zero or 1; b denotes an integer of from 1 to 4; m and n each denote zero or 1, the sum of m + n being 1; p and q each denote zero or 1, the sum of p + q being 1; and c and d each denote zero or an integer of from 1 to 3; and - 2 - (b) a compound which is polymerisable under the influence of a free radical catalyst to form a higher molecular weight material which is more soluble in a developer than the composition prior to exposure, so that the solubility of the composition in a developer is increased in the exposed portion; and (2) treating the composition with a developer to remove the exposed portion.
394930
Green George E.
Waterhouse John S.
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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