C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 8/28 (2006.01) B41C 1/10 (2006.01) B41N 1/00 (2006.01) C08F 8/42 (2006.01) C08F 12/24 (2006.01) C08L 25/18 (2006.01) C08L 61/14 (2006.01) C08L 61/16 (2006.01) G03F 7/039 (2006.01) G03F 7/075 (2006.01)
Patent
CA 2448029
The present invention provides image-forming compositions and photosensitive lithographic plates which are excellent in sensitivity to infrared radiation, latitude of development, treatable area in m2, and printing durability. Specifically, the present invention provides an image-forming composition comprising (A) a polymeric compound obtainable by the addition reaction of a resinous polymer having one or more phenolic hydroxyl groups with a silane coupling agent of the following general formula (1) or (2), (B) an acid generator, (C) an infrared absorber, and (D) an alkali- soluble resin, and a photosensitive lithographic plate having this image-forming composition applied onto a substrate. (see formula I, II) wherein X1 and X2 each represent a trimethoxysilyl group or the like: G1 represents O or COO; R1 and R2 each independently represents a hydrogen atom or a methoxy group; R3 represents (CH2)m which may have a hydrocarbon side chain; G2 represents O or COO; R4 represents a hydrogen atom or a straight-chain or branched alkyl group; and R5 represents (CH2)n which may have a hydrocarbon side chain.
Fetherstonhaugh & Co.
Okamoto Chemical Industry Co. Ltd.
LandOfFree
Image-forming composition and photosensitive lithographic... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Image-forming composition and photosensitive lithographic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Image-forming composition and photosensitive lithographic... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1677005