C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/242.01
C07D 487/04 (2006.01) C07D 239/46 (2006.01) C07D 239/70 (2006.01) C07D 239/95 (2006.01)
Patent
CA 1228589
ABSTRACT OF THE DISCLOSURE: The present invention relates to a process for preparing compounds of the general formula (I): Image (I) wherein R represents an alkyl, alkenyl, cycloalkyl, (cyclo- alkyl)alkyl, aryl, thienyl or pyridyl radical; R1 and R2, which may be the same or different, each represents a hydro- gen atom or an alkyl, alkenyl, cycloalkyl, (cycloalkyl)alkyl, benzyl or phenethyl radical or R1 and R2 together represent a straight-chain alkylene radical, the above groups R, R1 and R2 each being optionally substituted by one or more halogen atoms or alkyl, alkoxy, alkylthio, amino, alkylamino, dialkylamino or trifluoromethyl radicals; X represents an oxygen or sulphur atom; and R3 represents an alkyl radical; and pharmaceutically acceptable acid addition salts thereof. The new compounds of formula (I) have valuable pharmacologi- cal properties, especially in the treatment of anxiety. Certain of the intermediate compounds used in the preparation of the compounds of formula (I) are also new.
435419
Robic Robic & Associes/associates
Roussel-Uclaf
LandOfFree
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