C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/210, 260/239
C07D 487/04 (2006.01) C07D 243/14 (2006.01) C07D 487/14 (2006.01) C07D 495/04 (2006.01) C07D 495/14 (2006.01)
Patent
CA 1252462
Abstract Compounds of the general formula Image I wherein A together with the two carbon atoms denoted by .alpha. and .beta. signifies one of the groups Image (1) (2) (3) (4) and the dotted line signifies the double bond present in cases (1), (2) and (4) and wherein R1 signifies a 5- or 6-membered aromatic heterocyclic group or the group -C(R6)=NOR7(B), R2 signifies hydrogen and R3 signifies hydrogen or lower alkyl or R2 and R3 together signify dimethylene, trimethylene or propenylene, R4 and R5 each signify hydrogen, halogen, trifluoromethyl, cyano, nitro, amino or lower alkyl, R6 signifies hydrogen or lower alkyl and R7 signifies lower alkyl, the compounds of formula I having the (S) or (R,S) configuration with reference to the carbon atom denoted by .gamma. when R2 and R3 together signify dimethylene, trimethylene or propenylene, and pharmaceutically acceptable acid addition salts thereof have a pronounced affinity to the central benzodiazepine receptors and have anxiolytic, anticonvulsant, muscle relaxant and sedative-hypnotic properties.
472158
Hunkeler Walter
Kyburz Emilio
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited/hoffmann-La Roche Limitee
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