C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/102, 260/104
C07D 501/20 (2006.01) C07D 209/48 (2006.01) C07D 233/54 (2006.01) C07D 257/04 (2006.01) C07F 7/10 (2006.01)
Patent
CA 1161430
Abstract A compound of the formula Image wherein R is hydrogen, alkali metal, Image alkyl or Image ; R1 is hydrogen or methyl; R2 is hydrogen or methyl; R3 is hydrogen or methyl; R4 is hydrogen, -OCONH2, Image or -O-?-lower alkyl; R5 is hydrogen or methyl; R6 is hydrogen, methyl, benzyl or acetyl; R7 is hydrogen or lower alkyl; R8 is hydrogen or -CONH2; R9 is hydrogen, lower alkyl, -(CH2)p-?-OR11; Image or -(CH2)p-N-(lower alkyl)2; Abstract: R10 is hydrogen or lower alkyl; R11 is hydrogen, sodium or potassium; n is 1, 2, 3 or 4; m is O, 1 or 2; p is 1, 2, 3 or 4, or a compound of the formula Image including its imino tautomeric form wherein the Image group is in the syn or anti configuration; R12 is hydro- gen, sodium, potassium, benzyl, p-methoxybenzyl, 2,2,2- trichloroethyl, diphenylmethyl, t-butyl-CH2-O-lower alkyl, Image R14 are independently selected from the group consistins of hydrogen, methyl, ethyl, i-propyl, n-propyl, and carboxyl; R15 is hydrogen, methyl, sodium or potassium; R16 is in the .alpha.-configuration and is hydrogen or methoxy: m is zero, one or two; n is zero or an integer from 1 to 4; R17 is hydrogen or lower alkyl; X is hydrogen Image Image R18 is hydrogen or lower alkyl; R19 is hydrogen, lower alkyl,-(CH2)p -COOR20, -(CH2)p -S03R20 or -(CH2)p-N-(lower alkyl)2; R20 is hydrogen, sodium or potassium, and p is an integer from 1 to 4. The compounds are useful as antibacterial agents.
363265
Breuer Hermann
Cimarusti Christopher M.
Denzel Theodor
Koster William H.
Sykes Richard B.
Osler Hoskin & Harcourt Llp
Squibb (e.r.) & Sons Inc.
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