C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/233, 260/315
C07D 233/91 (2006.01) A61K 31/41 (2006.01) C07D 249/10 (2006.01) C07D 249/14 (2006.01)
Patent
CA 1329392
ABSTRACT OF THE DISCLOSURE A novel heterocyclic derivative of formula (I): Image (I) wherein R1 represents Image or Image and R2 represents hydrogen or acyl. When R2 is acyl, the derivative can be prepared, for example, by the following process: Image + Image (II) (III) Image + Image (Ia) wherein R4 is acyl and R1 is Image or Image . The derivative is less toxic and has radiosensitizing activity and antiviral activity even at a low concentration. Radiosensitizing agents and antiviral agents containing the derivative as active component are also disclosed.
578527
Miyata Yoshiyuki
Mori Tomoyuki
Sakaguchi Masakazu
Suzuki Toshimitsu
Gowling Lafleur Henderson Llp
Pola Chemical Industries Inc.
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