C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 167/9.8
C07D 405/12 (2006.01) A01N 47/38 (2006.01) C07D 409/12 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1324608
ABSTRACT Imidazole derivatives which were provided as the new compound according to this invention and are re- presented by the formula: Image wherein R1 denotes a hydrogen atom or a lower alkyl group, R2 denotes a lower alkyl group, R3 denotes an alkenyl group, a cycloalkyl group, an alkoxyalkyl group or a higher alkyl group, R4 denotes a hydrogen atom or a lower alkyl group, and X denotes an oxygen atom or a sulfur atom, exhibit excellent antibacterial and anti- fungal activities against various kinds of microorganisms pathogenic to plants. The new imidazole derivatives according to this invention are useful especially as an agent for disinfecting the seeds.
541618
Hirota Yohjiro
Kuroda Nobuyuki
Sugiura Hisao
Tsujimoto Kazuyuki
Wada Takuo
Hokko Chemical Industry Co. Ltd.
Macrae & Co.
Sds Biotech K.k.
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