C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305
C07D 405/12 (2006.01) C07C 59/90 (2006.01) C07D 233/64 (2006.01) C07D 307/79 (2006.01) C07D 521/00 (2006.01)
Patent
CA 1155853
EV RAN 4450/47 ABSTRACT Compounds of the formula Image I wherein A represents a group of the formula Image or Image (a) (b) and R1, R2, R3 and R4 each represent a hydrogen or halogen atom, and their pharmaceutically acceptable acid addition salts with antifungal activity can be manufactured by reacting a compound A-CH2-X, wherein X represents a chlorine or bromine atom, with an alkali metal salt of a (R3)(R4)-.alpha.- [(1-imidazolyl)methyl]benzyl alcohol and, if desired, by conversion into a salt.
374678
Gowling Lafleur Henderson Llp
Hoffmann-La Roche Limited
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