C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 260/315
C07D 233/68 (2006.01)
Patent
CA 1124244
ABSTRACT OF THE DISCLOSURE Novel imidazole derivatives of the fonmula Image wherein Rl is hydrogen, nitro or amine, R2 is a phenyl, furyl or thienyl group which may be substituted by halogen, lower alkyl, lower alkoxy or di-lower-alkylsmino, R3 is hydrogen or lower alkyl and X is halogen, and their physio- logically acceptable salts, have excellent diuretic and hypotensive actions.
327260
Furukawa Yoshiyasu
Hashimoto Naoto
Matsumura Koichi
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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