C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 260/315
C07D 233/61 (2006.01) A61K 31/415 (2006.01) A61K 31/44 (2006.01) C07D 233/00 (2006.01) C07D 401/00 (2006.01) C07D 401/02 (2006.01) C07D 401/06 (2006.01) C07D 401/12 (2006.01) C07D 405/00 (2006.01) C07D 405/06 (2006.01) C07D 405/12 (2006.01) C07D 409/00 (2006.01) C07D 409/06 (2006.01)
Patent
CA 1157477
ABSTRACT Compounds corresponding to the following general formula: Image wherein Ar and Ar1, which may be the same or different, each represents an aromatic radical which may be substituted one or more times by halogen and/or nitro and/or lower alkyl and/or trihalomethyl and/or cyano and/or lower alkoxy and/or di-lower akyl-amino, the alkyl groups optionally completing a ring optionally incorporating a further heteroatom, and/or lower alkyl sulphonyl; Alk1 and Alk2, which may be the same or different, each represents an alkylene group containing from one to eight carbon atoms which may be substituted one or more times by aryl an and/or cycloalkyl and/or lower alkyl and if two such alkyl groups are present, they may complete a ring optionally containing a heteroatom and in which imidazole ring may be further substituted; and m represents 0 or 1; provided that not both Ar and Ar1 represent phenyl; and acid addition salts thereof such compounds are prepared by reaction of a compound corresponding to the following general formula: Image with a compound of the formula: Ar1-NH-NH2 The compounds have an anti-fungal activity as well as an antianerobic and anti-thrombotic activity.
369236
Fellner Peter J.
Hamill Brendan J.
Manley Paul W.
Riches Mckenzie & Herbert Llp
Searle (g. D.) & Co.
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