C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/305, 260/315
C07D 233/56 (2006.01) A01N 43/50 (2006.01) A61K 31/415 (2006.01) C07D 233/00 (2006.01) C07D 233/58 (2006.01) C07D 233/61 (2006.01) C07D 403/04 (2006.01) C07D 405/00 (2006.01) C07D 405/04 (2006.01) C07D 409/00 (2006.01) C07D 409/02 (2006.01) C07D 409/04 (2006.01) C07D 409/08 (2006.01)
Patent
CA 1181077
Abstract Compounds of the general formulae: Image Image I II in which Ar and Ar1 which may be the same or different represent aromatic radicals optionally substituted once or more than by substituents selected from halogen, lower alkyl and lower alkoxy and Alk represents an alkylene group containing from 1 to 4 carbon atoms which alkylene group may be interrupted with a heteroatom; and acid addition salts thereof. These compounds have anti-anaerobe and also anti-fungal activity and are non-mutagenic.
395423
Ellames George
Fellner Peter J.
Floyd Christopher D.
Manley Paul W.
Osler Hoskin & Harcourt Llp
Searle (g. D.) & Co.
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