C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/231, 167/237
C07D 233/96 (2006.01) A61K 31/415 (2006.01) C07D 401/06 (2006.01) C07D 405/06 (2006.01) C07D 409/06 (2006.01)
Patent
CA 2005248
ABSTRACT Compounds of the general formulae:- Image Image (I) (I') wherein R1 and R2, which can be the same or different, are hydrogen atoms or C1-C5-alkyl radicals, C3-C5- alkenyl radicals or phenyl radicals or, together with the carbon atom to which they are attached, form a saturated or unsaturated C3-C7 ring, R3 and R4, which can be the same or different, are hydrogen atoms, straight-chained or branched C1-C10-alkyl radicals, straight-chained or branched C3-C7-alkenyl radicals, C3-C7-cycloalkyl radicals, C3-C7-cycloalkenyl radicals, phenyl, arylalkyl or hetarylalkyl radicals, R5 is a hydrogen atom or a lower alkyl radical and X is an oxygen or sulphur atom or an imino group, display an immunosuppressive action, and more especially a specifi- cally effective immunosuppressive action thereby having a significant advantage over prior non-specific immuno- suppressives.
Bosies Elmar
Haag Rainer
Herrmann Dieter
Pahlke Wulf
Schultz Michael
Boehringer Mannheim Gmbh
Swabey Ogilvy Renault
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