C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 471/04 (2006.01) A61K 31/435 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) A61K 31/54 (2006.01) C07D 213/36 (2006.01) C07D 213/38 (2006.01) C07D 295/135 (2006.01) C07D 401/06 (2006.01) C07D 405/06 (2006.01) C07D 409/06 (2006.01)
Patent
CA 2213773
Compounds of formula (II), wherein L, A, X, B, R2, R3, W, D, E, R3, R4, R5 are as defined in the specification, are dual histamine H1 and PAF receptor antagonists.
Des composés de la formule (II), dans laquelle L, A, X, B, R?2¿, R?3¿, W, D, E, R?3¿, R?4¿ et R?5¿ possèdent les notations données dans la description, présentent une double activité antagoniste à l'égard des récepteurs de l'histamine (H1) et du facteur d'activation plaquettaire (PAF).
Ayscough Andrew Paul
Blackwell Christopher Mark
Launchbury Steven
Whittaker Mark
British Biotech Pharmaceuticals Limited
Gowling Lafleur Henderson Llp
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