C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/306, 260/316
C07D 207/44 (2006.01) C07D 207/452 (2006.01) C07D 209/48 (2006.01) C07F 7/18 (2006.01) C07F 7/21 (2006.01) C08G 69/26 (2006.01)
Patent
CA 1077490
Abstract of the Disclosure Imidyl compounds of the formula Image (I) wherein n is 1 or 2, R1 and R? each represent alkyl or together represent a tri- or tetramethylene group, Y represents, for example, alkylene, cycloalkylene and X represents various organic groups as detailed, are suitable for the manufacture of polymers which can be crosslinked by light. Suitable polymers include polyesters, polyamides, polyamide-imides, polyimides, polyester-polyamides, polyester-amido-imides, polyethers, polyamines, polysaccharides and polysiloxanes. Polymers of this type are suitable for carrying out photochemical processes. Compared with known polymers, the polymers based on the imidyl compounds according to the invention have the advantage that they are photochemically substantially more sensitive. In addition, this sensitivity can also be further increased effectively by a combination with sensitisers.
255016
Baumann Marcus
Kvita Vratislav
Roth Martin
Waterhouse John S.
Ag Ciba-Geigy
Baumann Marcus
Kvita Vratislav
Roth Martin
Waterhouse John S.
LandOfFree
Imidyl compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Imidyl compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Imidyl compounds will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-184234