C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
C02F 9/04 (2006.01) C02F 1/00 (2006.01) C02F 1/463 (2006.01) C02F 1/56 (2006.01) C02F 9/02 (2006.01)
Patent
CA 2674353
A system and process for continuously and immediately removing contaminants from wastewater and treating wastewater, where the wastewater is treated to supply fluid that can be reused in the cleaning system or discharged safely into the environment is disclosed. The system and method comprises one or more pumping means for circulating and recirculating fluids captured or collected by the system to one or more of the processes in the system, such as wash water applications or further treatment cycles. According to one embodiment, the wastewater is transported through purification sections of the device. Depending on the system used, these sections could include several of the following: pre-treatment to remove debris and certain heavy solids; treatment by methods such as a conductivity solution injection system and/or electrolytic coagulation system, a polymer injection system, and a inline mixer for mixing the polymer in the wastewater stream; and an ozone treatment system. In a preferred embodiment, each of the treatment sections are contained within an enclosure cabinet that includes a controller and feed containers for conductivity fluid and polymers.
Ashley Dennis
Checketts Ben
Mortensen James
C-Tech Industries Inc.
Parlee Mclaws Llp
LandOfFree
Immediate cleaning and recirculation of cleaning fluid and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Immediate cleaning and recirculation of cleaning fluid and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Immediate cleaning and recirculation of cleaning fluid and... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1764577