Improved chemical drying and cleaning system

F - Mech Eng,Light,Heat,Weapons – 26 – B

Patent

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F26B 3/00 (2006.01) H01L 21/00 (2006.01) H05K 3/26 (2006.01)

Patent

CA 2303979

A system (11) for drying and/or cleaning a workpiece (17A), such as an electronic part, semiconductor wafer, printed circuit board or the like. As the workpiece is withdrawn from a processing or rinsing liquid (13), a selected drying and/or cleaning liquid, such as hydrofluoroether (HFE), an ethylated hydrofluoroether or an azeotrope of a hydrofluoroether or ethylated hydrofluoroether, that has a very small surface tension, is volatile, and has a density much greater than the processing liquid density, is sprayed on, dribbled on, or otherwise transferred to an exposed surface of the workpiece. The workpiece can be dried in 7-45 seconds, or less, in most situations and can be cleaned using the invention. Drying and/or cleaning can be performed in a single workpiece process, a single workpiece, continuous process, or a batch process.

L'invention concerne un système (11) permettant de sécher et/ou de nettoyer un objet (17A), tel qu'un composant électronique, une tranche de semi-conducteur, une plaquette de circuit imprimé etc. Lorsque l'objet est retiré d'un liquide (13) de traitement ou de rinçage, un liquide de séchage et/ou de nettoyage sélectionné tel que l'hydrofluoroéther (HFE), un hydrofluoroéther éthylé ou un azéotrope d'un hydrofluoroéther ou d'un hydrofluoroéther éthylé, qui présente une tension superficielles très faible, est volatile et présente une densité largement supérieure à celle du liquide de traitement, est vaporisé, appliqué sous forme de gouttes ou transféré d'une autre façon sur une surface exposée de l'objet. Dans la plupart des cas, l'objet peut être séché en 7-45 secondes, voire moins, et peut être nettoyé en utilisant le système de l'invention. Le séchage et/ou le nettoyage peuvent être exécutés dans le cours d'un traitement par pièce, un traitement en continu par pièce ou un traitement par lots.

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