B - Operations – Transporting – 23 – K
Patent
B - Operations, Transporting
23
K
B23K 35/22 (2006.01) B23K 10/00 (2006.01) H05H 1/34 (2006.01)
Patent
CA 2136203
The diameter of a hafnium insert (44) press fit into the bottom end of a cop- per electrode (42) varies as a function of the level of a current carried by the elec- trode. The diameter is the minimum necessary to support emission at that currentlevel while also protecting the copper body against attack by the arc. The insert (44) is generally circular and preferably extends completely through the bottom wall (42g) to a circulating flow of cooling water at a hollow interior (48) of the electrode. The bottom wall includes an annular recess (42d) in a portion of the copper wallsurrounding the insert. A coolant tube (56) extends into the recess in a spaced rela- tionship to provide a high flow velocity of the coolant over the interior rear surface of the electrode.
Backander Patrik
Couch Richard W. Jr.
Lu Zhipeng
Luo Lifeng
Sanders Nicholas A.
Hypertherm Inc.
Riches Mckenzie & Herbert Llp
LandOfFree
Improved electrode for high current density plasma arc torch does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Improved electrode for high current density plasma arc torch, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Improved electrode for high current density plasma arc torch will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2073759