Improved laser pattern generation apparatus

Details Improved laser pattern generation apparatus Improved laser pattern generation apparatus

H - Electricity

01

L

H01L 21/268 (2006.01) B23K 26/04 (2006.01) B23K 26/067 (2006.01) G02B 26/12 (2006.01) G03F 7/20 (2006.01) H04N 1/047 (2006.01) H04N 1/113 (2006.01) H04N 1/191 (2006.01)

Patent

CA 2148122

2148122 9409989 PCTABS00032 An improved laser pattern generation apparatus. The improved pattern generation apparatus of the present invention uses a laser beam (501) to expose a radiant sensitive film on the workpiece (516) to print circuit patterns on a substrate. The laser beam is aligned using a beam steering means. The laser beam (501) is split into 32 beams to create a brush. The brush scans the workpiece (516) through use of a rotating polygonal mirror (510). Each beam of the brush may have one of seventeen intensity values. The beams are modulated by an Acousto-Optical Modulator (506) signals provided to the Acousto-Optical Modulator (506) define the pattern to be generated. The signals are created by a rasterizer (507) increased print speed is accomplished through the use of a wider brush and a print strategy that eliminates physical stage passes.

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