Improved washing system

Details Improved washing system Improved washing system

C - Chemistry, Metallurgy

11

D

C11D 3/43 (2006.01) C11D 17/00 (2006.01) C11D 7/24 (2006.01) C11D 7/26 (2006.01) C11D 7/28 (2006.01)

Patent

CA 2465823

The invention relates to a cleaning composition suitable for manually cleaning substrates. The composition comprises at least two immiscible liquid phases having one liquid-liquid interface with an interfacial tension of more than 5mN/m, the difference in density between the two liquid phases being not more than 0.2g/cc. After agitation, the composition is applied to the substrate to be cleaned, and subsequently friction is applied to the substrate. The composition provides for the required stability after agitation, and gives good detergency, particularly as regards particulate soil.

L'invention concerne une composition nettoyante conçue pour laver manuellement des substrats. Cette composition comprend au moins deux phase liquides immiscibles possédant une interface liquide-liquide avec une tension interfaciale supérieure à 5mN/m, la différence de densité entre les deux phases liquides étant inférieure ou égale à 0,2g/cc. Après agitation, la composition est appliquée sur le substrat à nettoyer, puis le substrat est frotté. Cette composition possède la stabilité requise après agitation, ainsi que de bonnes propriétés détergentes, plus spécifiquement contre des salissures particulaires.

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