Improvement in aqueous stripping and cleaning compositions

Details Improvement in aqueous stripping and cleaning compositions Improvement in aqueous stripping and cleaning compositions

C - Chemistry, Metallurgy

09

D

C09D 9/00 (2006.01) C11D 3/20 (2006.01) C11D 3/28 (2006.01) C11D 3/30 (2006.01) C11D 7/26 (2006.01) C11D 7/32 (2006.01) C11D 11/00 (2006.01) C23G 1/20 (2006.01) G03F 7/32 (2006.01) G03F 7/42 (2006.01) H01L 21/306 (2006.01)

Patent

CA 2317393

An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal- organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.

La présente invention concerne une composition aqueuse de décapage renfermant un mélange d'une amine organique et d'un inhibiteur de corrosion constitué par du benzotriazole seul ou en combinaison avec de l'acide gallique, son ester ou analogue. Ladite composition convient bien pour le décapage de photorésines, de résidus organiques ou organométalliques engendrés par un traitement au plasma, de sels inorganiques, d'oxydes, d'hydroxydes ou de complexes en combinaison, ou à l'exclusion, de films de photorésine organique, à de basses températures avec faible corrosion de substrats renfermant du cuivre ou du titane.

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