Improvements for rapid prototyping apparatus

Details Improvements for rapid prototyping apparatus Improvements for rapid prototyping apparatus

B - Operations, Transporting

29

C

B29C 67/00 (2006.01)

Patent

CA 2740851

A stereolithography apparatus and an exposure system for a stereolithography apparatus, wherein light emitting diodes are used as light sources. The invention relates to aligning light from the light emitting diode and to the exchange and control the light emitting diodes.

La présente invention se rapporte à un appareil de stéréolithographie et à un système dexposition pour appareil de stéréolithographie. Des diodes électroluminescentes sont utilisées comme sources de lumière. Linvention se rapporte à lalignement de la lumière provenant de la diode électroluminescente ainsi quà léchange et à la commande des diodes électroluminescentes.

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