C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/44 (2006.01) C11D 1/83 (2006.01) C11D 3/43 (2006.01) C11D 7/50 (2006.01) C11D 17/00 (2006.01) C11D 1/14 (2006.01) C11D 1/72 (2006.01)
Patent
CA 2136850
2136850 9325654 PCTABScor01 The invention provides a homogeneous, aqueous, cleaning composition which comprises surfactant and solvent, and is characterized in that it forms a solvent-water emulsion on evaporation of at least a portion of the solvent. In such systems the solvent system is selected such that it comprises: a first solvent component in an amount such that it is present at a level above the miscibility limit of that component with water, and, a second solvent component which is sufficiently volatile that, in use, it evaporates from the composition to leave a mixture of the first solvent component and water, said second solvent component being present at a level such that first solvent component is solubilised in the composition. By using the second solvent to assist in the solution of the first solvent it is possible to obtain compositions which are clear, stable, isotropic compositions. In use, the second, volatile solvent component evaporates from the overall composition and the remaining first solvent component and water phase-separate, thus forming an emulsion, whereby the cleaning action of the first solvent component is potentiated. The emulsion formed generally has a coarse dispersed phase. This yields the advantages of a stable non-emulsion product as regards storage, dosing and manufacture, employs a relatively low level of solvent and provides the cleaning benefits of a free-solvent system.
Instone Terry
Wells John Francis
Bereskin & Parr
Plc Unilever
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