In-line gas purity monitoring and control system

Details In-line gas purity monitoring and control system In-line gas purity monitoring and control system

G - Physics

05

D

G05D 11/08 (2006.01) B01D 53/02 (2006.01) B01D 53/22 (2006.01) B01J 7/00 (2006.01) C01B 3/50 (2006.01)

Patent

CA 2662830

Apparatus for generating a high purity gas product comprising (a) a proportional flow control/mixing valve having an inlet for a first gas stream comprising a major component and an impurity, an inlet for a second gas stream comprising the major component, and an outlet to supply a mixed gas stream;(b) an analysis zone with sensor to measure the concentration of the impurity in the mixed gas stream and generate a first signal proportional thereto; and (c) control means to receive and compare the first signal with a parameter proportional to the concentration of the impurity in the first gas stream and a second parameter proportional to a maximum allowable concentration in the high purity gas product, generate a second signal proportional to the ratio of the first and second parameters, and transmit the second signal to the proportional flow control/mixing valve to adjust the flow rates of the first and second gas streams.

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