C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/550.1, 260/4
C07C 69/738 (2006.01) A01N 37/42 (2006.01) C07C 235/78 (2006.01) C07D 295/185 (2006.01) C07D 295/192 (2006.01)
Patent
CA 2002014
Discloses indan derivatives represented by the general formula (I): Image (I) wherein R is a lower alkoxy group, a phenoxy group, Image , whereupon R1 and R2 are, respectively, a hydrogen atom, a lower alkyl, lower alkenyl, phenyl, or phenyl group substituted by halogen atoms, or R1 and R2 together with the nitrogen atom to which they are bonded form a monopholino group. The indan derivatives demonstrated satisfactory results in respect of a weeding effect and safety in practical use.
Hashimoto Isao
Kitahara Takumi
Yokoyama Keiichi
Hashimoto Isao
Kirby Eades Gale Baker
Kitahara Takumi
Mitsui Chemicals Incorporated
Yokoyama Keiichi
LandOfFree
Indan derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Indan derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Indan derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2041719