C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 237/14 (2006.01) A61K 31/50 (2006.01) C07D 401/12 (2006.01)
Patent
CA 2138812
Disclosed are an indane compound represented by the for- mula: Image (I) wherein R1 represents a lower alkyl group, a lower alkenyl group or a substituted or unsubstituted mono- cyclic aromatic heterocyclic group having nitrogen atom as a hetero atom; R2 represents hydrogen atom or a lower alkyl group; and A represents a lower alkylene group, or a pharmaceutically acceptable salt thereof and processes for preparing the same.
Homma Koichi
Ishida Akihiko
Nishiyama Shinsuke
Okumura Fumikazu
Yato Michihisa
Marks & Clerk
Tanabe Seiyaku Co. Ltd.
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