C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 237/14 (2006.01) A61K 31/495 (2006.01) C07D 237/04 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01) C07D 405/12 (2006.01) C07D 409/12 (2006.01)
Patent
CA 2139088
Disclosed are an indane compound represented by the formula: Image (I) wherein R1 is aryl, lower alkyl, cycloalkyl, halogeno- lower alkyl, lower alkenyl, phenyl-substituted lower alkenyl, monocyclic or bicyclic aromatic heterocyclic having N, O or S as a hetero atom, lower alkoxy, phenoxy, lower alkylamino, lower alkenylamino, phenyl- amino, lower alkyl substituted by monocyclic or bicyclic aromatic heterocyclic having N, O or S as a hetero atom, or lower alkenyloxy; R2 is H or lower alkyl; X is carbonyl or thiocarbonyl; Alk is single bonding arm or lower alkylene; and the dotted line is presence or absence of a double bond, or a pharmaceutically acceptable salt thereof, processes for preparing the same and a synthetic intermediate thereof.
Homma Koichi
Ishida Akihiko
Nishiyama Shinsuke
Okumura Fumikazu
Yato Michihisa
Marks & Clerk
Tanabe Seiyaku Co. Ltd.
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