C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/541, 260/291
C07D 213/60 (2006.01) C07C 205/38 (2006.01) C07C 205/45 (2006.01) C07D 213/65 (2006.01) C07D 213/70 (2006.01)
Patent
CA 1124724
ABSTRACT OF THE DISCLOSURE The invention provides a compound of the general formula Image (I). wherein Ar represents a phenyl or pyridyl radical each unsub- stituted or substituted by one or more substituents selected from halogen, (C1-C4)alkyl. and trifluoromethyl, X represents oxygen or sulphur, R1 represents (C1-C4)alkyl unsubstituted or substituted by one or more substituents selected from fluorine and chlorine, A represents -CH2-CH2-CH2-, -CH=CH-CH2-, Image , Image , Image or Image , wherein Y represents oxo, hydroxyimino, (C1-C4)alkoxyimino, phenylhydrazono or p-toluenesulphonylhydrazono, Z represents hydroxy, (C1-C6)acyloxy, R1SO3-, amino, (C1-C6)acylamino, R1SO2HN- or cyano, n represents 0, 1 or 2, and R2 represents (C1-C4)alkyl, or phenyl unsubstituted or substituted by one or more substituents selected from halogen, (C1-C4)alkyl, nitro and carboxy, the -CY- or -CHZ- group or -CH2- group of -CH=CH-CH2- being either meta or para to ArX, and V represents hydrogen, (C1-C6)acyl or R1SO2-, and salts thereof, and a process for their preparation. These compounds have pharmaceutical activity, e.g. anti-inflammatory activity.
332665
Bottcher Irmgard
Kapp Joachim-Friedrich
Rufer Clemens
Schroder Eberhard
Marks & Clerk
Schering Aktiengesellschaft
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