C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 403/10 (2006.01) A61K 31/416 (2006.01) A61K 31/438 (2006.01) A61K 31/454 (2006.01) A61K 31/496 (2006.01) A61K 31/5377 (2006.01) A61P 35/00 (2006.01) A61P 35/02 (2006.01) C07D 231/56 (2006.01) C07D 401/10 (2006.01) C07D 401/12 (2006.01) C07D 403/12 (2006.01) C07D 403/14 (2006.01) C07D 405/14 (2006.01) C07D 409/14 (2006.01) C07D 413/10 (2006.01) C07D 413/12 (2006.01) C07D 413/14 (2006.01) C07D 491/113 (2006.01)
Patent
CA 2518950
Indazole derivatives represented by the general formula (I) or pharmacologically acceptable salts thereof: (I) wherein R1 is CONR1aR1b(wherein R1a and R1b are each independently hydrogen, lower alkyl, aryl, aralkyl, or a heterocylcic group, or R1a and R1b together with the adjacent nitrogen atom may form a heterocyclic group) or the like; and R2 is hydrogen, CONR2aR2b (wherein R2a and R2b are as defined for R1a and R1b), NR2cR2d (wherein R2c and R2d are each independently hydrogen, lower alkyl, lower alkanoyl, aroyl, heteroaroyl, aralkyl, alkylsulfonyl, or arylsulfonyl) or the like.
L'invention concerne des dérivés indazole représentés par la formule générale (I) ou des sels pharmaceutiquement acceptables de ces dérivés : R?1¿ est CONR?1a¿R?1b ¿(R?1a¿ et R?1b¿ sont chacun indépendamment hydrogène, alkyl inférieur, aryl, aralkyl, ou un groupe hétérocyclique, ou R?1a¿ et R?1b¿ et l'atome d'azote adjacent forment un groupe hétérocyclique) ou similaires ; et, R?2¿ est hydrogène, CONR?2a¿R?2b¿ (R?2a¿ et R?2b¿ sont comme R?1a¿ et R?1b¿), NR?2c¿R?2d¿ (R?2c¿ et R?2d¿ sont chacun indépendamment hydrogène, alkyl inférieur, alkanoyl inférieur, aroyl, hétéroaroyl, aralkyl, alkylsulfonyl, ou arylsulfonyl) ou similaires.
Ando Hiromi
Kanai Fumihiko
Kanda Yutaka
Kawashima Keiko
Kiyoi Hitoshi
Goudreau Gage Dubuc
Kyowa Hakko Kirin Co. Ltd.
Kyowa Hakko Kogyo Co. Ltd.
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