C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/295, 260/326
C07C 255/47 (2006.01) C07C 45/67 (2006.01) C07C 49/697 (2006.01) C07C 62/38 (2006.01) C07C 323/63 (2006.01) C07D 207/337 (2006.01) C07D 213/57 (2006.01) C07D 317/60 (2006.01) C07D 333/24 (2006.01)
Patent
CA 1302420
ABSTRACT OF THE DISCLOSURE Disclosed are indene compounds of formula I: Image I wherein R1 is (a) a phenyl group optionally substituted; or (b) a bicyclic aromatic group, such as naphtnalene or quinoline; or (c) a heteroaromatic group selected from thiophene, pyridine and pyrrole, optionally substituted; wherein R2 i3 H, halogen, lower alkyl, benzyl, lower alkylthio, lower alkylsulfonyl, dilower alkylsulfamoyl, acylamino, benzylamino, dilower alkylamino, cyano, pyrrole, dilower alkylpyrrole, trifluoromethyl, methoxy, or tri- fluoromethoxy; wherein R3 is CN, COOR4, -CON(R4)2, or COR4, wherein R4 is a lower alkyl group, and "n" is an integer of 1-3 inclusive. A method for preparing such compounds is also disclosed. The compounds are useful as intermediates in the preparation of pharmacologically-active compounds and are distinguished from prior art compound by their unsuggested structure and utility.
553169
Bech Sommer Michael
Bogeso Klaus Peter
H. Lundbeck A/s
Perley-Robertson Hill & Mcdougall Llp
LandOfFree
Indene derivatives and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Indene derivatives and methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Indene derivatives and methods will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1326681