C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 209/08 (2006.01) A61K 31/404 (2006.01) A61K 31/405 (2006.01) A61K 31/4439 (2006.01) A61K 31/5377 (2006.01) A61P 1/00 (2006.01) A61P 1/18 (2006.01) A61P 9/10 (2006.01) A61P 11/00 (2006.01) A61P 11/04 (2006.01) A61P 11/06 (2006.01) A61P 11/08 (2006.01) A61P 11/16 (2006.01) A61P 15/08 (2006.01) A61P 17/00 (2006.01) A61P 17/04 (2006.01) A61P 17/06 (2006.01) A61P 19/02 (2006.01) A61P 19/10 (2006.01) A61P 25/00 (2006.01) A61P 25/04 (2006.01) A61P 29/00 (2006.01) A61P 37/08 (2006.01) A61P 43/00 (2006.01) C07D
Patent
CA 2681979
Disclosed is a compound represented by the formula (I) below and having a cPLA2 inhibitory activity, a salt thereof, or a solvate of any of them. Also disclosed are a pharmaceutical composition, a cPLA2 inhibitor and production inhibitors of various lipid mediators, each containing the compound, a salt thereof, or a solvate of any of them as an active ingredient. (I)
L'invention concerne un composé représenté par la formule (I) ci-dessous et ayant une activité inhibitrice de cPLA2, un sel de celui-ci, ou un solvate de ceux-ci. L'invention concerne également une composition pharmaceutique, un inhibiteur de cPLA2 et des inhibiteurs de la production de divers médiateurs lipidiques, chacun contenant le composé, un sel de celui-ci ou un solvate de ceux-ci comme ingrédient actif. (I)
Hayashi Yasuhiro
Katayama Toyoko
Nakatsuka Takashi
Tomoo Toshiyuki
Asubio Pharma Co. Ltd.
Daiichi Sankyo Company Limited
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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