Inductively coupled plasma sputter chamber with conductive...

Details Inductively coupled plasma sputter chamber with conductive... Inductively coupled plasma sputter chamber with conductive...

H - Electricity

01

J

H01J 37/32 (2006.01)

Patent

CA 2202530

A shade (23) is disposed on the inner wall of an inductively coupled plasma chamber, covering a protected zone (24) of the wall generally opposite to the inductive coil (11) driving the chamber, preventing accumulation of material sputtered from a wafer (13) in this zone, and thus restricting closed paths for eddy current flow along the chamber wall (12), improving inductive coupling of electrical power to the plasma in the chamber.

Un écran (23) placé sur la paroi interne d'une chambre plasmique à couplage inductif, couvrant une partie protégée (24) de la paroi placée généralement en face de la bobine inductive (11) alimentant la chambre, empêche l'accumulation de matières pulvérisées par une plaquette (13) dans cette zone, ce qui limite le bouclage des courants de Foucault le long de la paroi (12) de la chambre et améliore le couplage inductif de l'énergie électrique au plasma dans la chambre.

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