Inductively coupled source for deriving substantially...

Details Inductively coupled source for deriving substantially... Inductively coupled source for deriving substantially...

H - Electricity

05

H

H05H 1/46 (2006.01) C23C 14/35 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2207154

A coil exciting a plasma of an r.f. vacuum plasma processor for a workpiece processed surface in a chamber includes plural arcuate radially extending turns. The coil, chamber and workpiece are arranged to produce in the chamber a magnetic flux having substantially greater density in peripheral portions of the coil and chamber than in a center portion of the chamber and coil so a substantially uniform plasma flux is incident on a processed surface of the workpiece.

Un serpentin excitant un plasma d'un processeur de plasma rf sous vide pour une surface traitée d'une pièce dans une chambre comprend divers coudes arqués se prolongeant radialement. Le serpentin, la chambre et la pièce sont disposés de façon à produire dans la chambre un flux magnétique ayant une beaucoup plus grande densité en périphérie du serpentin et de la chambre qu'au centre de ceux-ci pour qu'un flux de plasma considérablement uniforme soit incident sur une surface traitée de la pièce.

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