Industrial waste water treatment cleaning method and apparatus

C - Chemistry – Metallurgy – 02 – F

Patent

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Details

C02F 9/04 (2006.01) C02F 1/00 (2006.01) C02F 1/52 (2006.01) C02F 1/68 (2006.01) G01N 33/18 (2006.01) C02F 1/24 (2006.01)

Patent

CA 2312057

A method and apparatus for controlling waste water treatment is disclosed. A feed-forward controller adjusts chemical injection pumps in response to signals from the contaminant zone, while delays to accommodate the time required for the contaminated water to reach the reaction or DAF tank are provided. Flow rate information from downstream of an equalization tank, but upstream of the chemical injection pumps, is monitored. By using both the data from the contamination points and the flow meter, the chemical injection pumps more accurately provide the necessary amount of chemicals to accommodate both volume of contaminated water and contaminant concentrations in the waste water.

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