Inorganic oxidant compositions for removing contaminants

B - Operations – Transporting – 08 – B

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B08B 3/08 (2006.01) C23G 1/14 (2006.01) H05K 3/26 (2006.01)

Patent

CA 2096452

INORGANIC OXIDANT COMPOSITIONS FOR REMOVING CONTAMINANTS ABSTRACT OF THE DISCLOSURE A composition for removing contaminants from a chosen solid substrate while avoiding negative environmental im- pact comprises: (a) an oxidizer selected from the group of (1) oxidizing agents which generate hydrogen peroxide upon dissolution in water, the oxidizing agent present in an amount sufficient to generate from about 0.01 percent by weight of hydrogen peroxide based on the composition up to the solubility limit of the oxidizing agent in the composi- tion, and (2) salts of halogen oxy-acids, present in an amount from about 0.01 percent by weight of the composition up to the solubility limit of the salt of the halogen oxy- acid in the composition; (b) an alkaline compound in suf- ficient amount to provide a pH of 7.0 or higher in the com- position; (c) about 0.01 to 5.0 percent by weight of a cho- sen wetting agent which is unreactive with the oxidizer and the alkaline compound; and (d) deionized water as the bal- ance of said composition. Optionally, the composition may further comprise about 0.01 to 10.0 percent by weight of a chosen materials protective agent. In operation, the solid substrate having contaminants thereon is exposed to the above-noted composition whereby the contaminants are re- moved from the substrate and are converted into non-toxic and non-hazardous products. In an alternative embodiment, contaminant removal is further enhanced by exposing the composition and the contaminants on the substrate to ul- traviolet radiation.

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