C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 33/20 (2006.01) B01J 23/887 (2006.01) B01J 37/03 (2006.01) B01J 37/06 (2006.01) C01B 33/22 (2006.01) C08K 3/34 (2006.01)
Patent
CA 2607161
The invention is directed to a synthetic inorganic material, comprising inorganic compounds based on elementary particles with a sheet (phyllosilicate) structure, the elementary particles consisting of a central layer of octahedrally coordinated divalent metal ions between two layers of tetrahedrally surrounded silicon ions, which particles are substantially free of aluminum, free silica and salts and hydroxides of the divalent metal ions, the material not containing any metal ions that can be reduced to the corresponding metals at temperatures of 700~C or less.
L'invention concerne une matière inorganique synthétique qui comprend des composés inorganiques à base de particules élémentaires ayant une structure en feuille (phyllosilicate). Ces particules élémentaires sont constituées d'une couche centrale d'ions métalliques bivalents à association octaédrique, placée entre deux couches d'ions de silicium en configuration tétraédrique, ces particules étant pratiquement exemptes d'aluminium, de silice libre et de sels et d'hydroxydes des ions métalliques bivalents. La matière selon l'invention ne contient pas d'ions métalliques pouvant être réduits aux métaux correspondants à des températures inférieures ou égales à 700 °C.
Dirksen Jacobus Berend
Geus John Wilhelm
Borden Ladner Gervais Llp
Eurosupport B.v.
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