C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/466.05, 167/
C07C 335/32 (2006.01) A01N 25/00 (2006.01)
Patent
CA 1052809
Abstract of the Disclosure Compound having the formula Image wherein R can be selected from the group con- sisting of benzyhydryl and lower alkyls having from about 5 to about 8 carbon atoms; R1 can be selected from the group of alkenyl, methyl thiomethyl, aryl, aralkyl, substituted aralkyl, cycloalkyl and lower alkyls, having from about 1 to about 6 carbon atoms; R2 can be selected from the group consisting of alkenyl, aryl, aralkyl, methyl thiomethyl, cycloalkyl and lower alkyls, having from about 5 to about 10 carbon atoms and X can be selected from the group con- sisting of organic acids, inorganic acids or is non-existant, thus forming a free base, the or- ganic and inorganic acids are preferably those selected from the group consisting of HI, HBr, HCl, H2SO4, (COOH)2, Chrysanthemumic acid, HCO2CH3, Image , (i-C3H7O)2P(S)SH, CH3(CH2)5<HCH2- CH(CH2)7COOH and CH3(CH2)7CH=CH(CH2)7COOH. These compounds are active insecticides, miticides and lepidoptericides which can be applied to insects, mites of lepidoptera at any stage of development. - 2 -
220258
Fancher Llewellyn W.
Freiberg Ashley H.
Na
Stauffer Chemical Company
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