Inspection system utilizing dark-field illumination

Details Inspection system utilizing dark-field illumination Inspection system utilizing dark-field illumination

G - Physics

01

N

340/124.4

G01N 21/88 (2006.01) G01N 21/956 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1226348

- 15 - INSPECTION SYSTEM UTILIZING DARK-FIELD ILLUMINATION Abstract For inspecting photolithographic masks, and the like, of the type comprising an ordered mosaic of identical patterns on a substrate (10) surface, corresponding portions or features (42, 44) of pairs of patterns are simultaneously illuminated by dark-field illumination (60- 69) (incident light rays almost parallel to the surface) to cause light scattering from edges only of the features and of any defects associated therewith. The presence of a defect (40) in or at one of the features gives rise to a difference in the light scattering characteristic from the two features, which difference provides an error signal indicative of the presence of a defect. (FIG. 4)

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