Installation for the vacuum treatment notably of substrates

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 14/56 (2006.01) C23C 16/54 (2006.01) H01L 21/00 (2006.01) H01L 21/677 (2006.01)

Patent

CA 2493988

Disclosed is an installation which is characterized by the fact that it comprises several independent and aligned modules (M). Each of said modules (M) is provided with a vacuum treatment chamber (C) and a transfer chamber (B) with means for transferring a substrate within one of the different chambers or from one chamber to another, the second chamber being located downstream or upstream from, directly next to, or separated by at least one module from the first chamber, such that a substrate can be transferred into one chamber in order to undergo a treatment while another substrate is placed in a different chamber for a specific treatment.

Cette installation est remarquable en ce qu'elle est composée de plusieurs modules indépendants et alignés (M) comprenant chacun une chambre de traitement sous vide (C) et une chambre de transfert (B) avec moyens de transfert d'un substrat, dans une des différents chambres ou d'une chambre à une autre située en aval ou en amont, directement à côté ou séparée d'au moins un module, de sorte que pendant qu'un substrat est dans une chambre pour un traitement spécifique, un autre substrat peut être transféré dans une autre chambre pour subir un autre traitement.

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