H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/121
H01L 21/768 (2006.01) H01L 23/532 (2006.01) H01L 27/06 (2006.01)
Patent
CA 1303250
20365-2775 ABSTRACT OF THE DISCLOSURE In an integrated circuit containing MOS transistors and/or bipolar transistors, the load resistors, which are arranged as thin-film elements on the field oxide zones which separate the active transistor zones, consist of polycrystalline silicon which is formed simultaneously with gate electrodes and/or the emitter and base terminal zones of the bipolar transistors on a substrate which contains the integrated circuit. The structuring of the load resistors is carried by way of an oxide mask which serves as an etch stop during the structuring of the gate electrode composed of a double layer of polysilicon and a silicide of a refractory metal. As only the polysilicon of the gate layer without overlying silicide is used for the load resistors, the sheet resistance of the load resistors can be set independently of that of the gates.
551975
Neppl Franz
Winnerl Josef
Aktiengesellschaft Siemens
Fetherstonhaugh & Co.
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