H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/124
H01L 27/04 (2006.01) H01L 27/06 (2006.01)
Patent
CA 1212485
ABSTRACT OF THE DISCLOSURE Integrated semiconductor circuits with bipolar components preferably with at least one bipolar transistor and at least two Schottky diodes having different threshold voltages are disclosed along with a method of producing such circuits. The contact from a metal interconnect level to diffused active regions of the circuits comprises a directly deposited silicide of a high melting point metal such as tantalum tungsten molybdenum or titanium. In addition to achieving independence from a metallization grid and achieving low- resistance wiring, the use of the silicide, in conjunction with the high temperature stability of silicides enables its simultaneous use as an implantation mask. The invention allows the production of bipolar integrated circuits in VLSI technology.
434348
Neppl Franz
Schwabe Ulrich
Aktiengesellschaft Siemens
Fetherstonhaugh & Co.
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