Interferometric plate alignment

Details Interferometric plate alignment Interferometric plate alignment

G - Physics

03

B

95/44, 88/0.1

G03B 1/00 (2006.01) G03F 9/00 (2006.01)

Patent

CA 1235937

ABSTRACT A photolithographic camera includes a system to monitor the alignment of a substrate supported in the camera. The light beam used to align the substrate is split by a beam splitter and one portion passes along the optical axis to the substrate and the other portion passes along a reference path. The two portions are recombined at a reference plane to establish an interference pattern. A photographic image of the desired interference pattern is also located at the reference plane and any differences between the two patterns produces Moire fringes indicating misalignment of the substrate.

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