C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/251, 260/295
C07D 213/55 (2006.01) C07D 239/24 (2006.01)
Patent
CA 1146553
ABSTRACT OF THE DISCLOSURE Intermediates of the formula: Image wherein R1 is hydrogen, amino or a protected amino group, and R1 are each hydrogen, halogen, lower alkoxy or aryl- thio, R14 is carboxy or a protected carboxy group, X is lower alkylene or a group of the formula: Image in which R6 is hydrogen or an organic residue which may have suitable substituent(s), and Z is N or CH, or salts thereof, are useful in the preparation of novel cephalosporanic acid derivatives, which in turn have antibacterial activity.
391232
Goto Jiro
Kamiya Takashi
Nakai Yoshiharu
Sakane Kazuo
Teraji Tsutomu
Fujisawa Pharmaceutical Co. Ltd.
Sherman
LandOfFree
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