C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/108
C07D 501/18 (2006.01)
Patent
CA 1338820
Compounds of the formula: Image wherein R3 is lower alkyl, hydroxy (lower) alkyl or a protected hydroxy (lower) alkyl, R4 is amino or a protected amino group, and R5 is hydrogen or lower alkyl. The salts of these compounds and the prep- aration of the compounds are also disclosed. These compounds are useful intermediates for the preparation of cephem compounds which are highly active against a number of pathogenic microorganisms.
616166
Kawabata Kohji
Miyai Kenzi
Sakane Kazuo
Takaya Takao
Fujisawa Pharmaceutical Co. Ltd.
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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