C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 233/54 (2006.01) A61K 49/04 (2006.01)
Patent
CA 2108061
ABSTRACT Compounds having the structure (Z?- COO - L - CO2M wherein (Z)-COO is the residue of an iodinated aromatic acid; M is H, a cation, ?CH2CH2O?mH, and ?CH2CH(OH)O?pH; m is an integer from 1 to 150; p is an integer from 1 to 50; and L is one or more divalent linking groups selected from alkylene, cycloalkylene, arylene, arylenealkylene, and alkylenearylene are particularly useful as wetting agents in x-ray imaging compositions.
Bacon Edward R.
Mcintire Gregory L.
Fetherstonhaugh & Co.
Nanosystems L.l.c.
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