H - Electricity – 01 – J
Patent
H - Electricity
01
J
356/176, 356/192
H01J 37/30 (2006.01) H01J 37/317 (2006.01)
Patent
CA 1266923
Ion Beam Implantation Display Method and Apparatus Abstract A display system for use in monitoring ion beam characteristics of an ion beam implantation system. The display includes a cathode ray tube having vertical and horizontal deflection controls. The vertical deflection control is modulated by an indication of ion beam current impinging upon a target wafer. The horizontal deflection control is modulated with a signal related to beam scanning by a deflection electrode. The resultant image provides a system operator with a visual indication of the ion beam.
544340
Axcelis Technologies Inc.
Borden Ladner Gervais Llp
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