Ion exchange removal of metal ions from wastewater

Details Ion exchange removal of metal ions from wastewater Ion exchange removal of metal ions from wastewater

C - Chemistry, Metallurgy

02

F

C02F 1/42 (2006.01) C02F 1/28 (2006.01) C02F 9/00 (2006.01)

Patent

CA 2333272

A novel process and apparatus are disclosed for cleaning wastewater containing metal ions in solution, hydrogen peroxide, and high solids, e.g., greater than about 50 mg/l particulate solids. A carbon adsorption column removes hydrogen peroxide in the wastewater feed containing high solids. An ion exchange unit removes the metal ions from solution. The process and apparatus remove metal ions such as copper from a high solids byproduct polishing slurry from the chemical mechanical polishing (CMP) of integrated circuit microchips to form an environmentally clean wastewater discharge.

L'invention concerne un procédé et un appareil nouveaux de nettoyage d'eaux usées contenant des ions métalliques en solution, un peroxyde d'hydrogène et une forte teneur en solides (p. ex. supérieure à environ 50 mg/l de particules solides). Une colonne d'adsorption sur charbon actif élimine le peroxyde d'hydrogène présent dans la charge d'eaux usées à forte teneur en solides. Une unité d'échange d'ions élimine les ions métalliques de la solution. Le procédé et l'appareil éliminent les ions métalliques, tels que le cuivre, d'une boue liquide de polissage récupérée comme sous-produit à haute teneur en solides provenant du polissage chimique mécanique (CMP) de microcircuits intégrés, afin de réaliser une évacuation d'eaux usées sans danger pour l'environnement.

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