Ion generating source for use in an ion implanter

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

H01L 21/265 (2006.01) H01J 3/00 (2006.01) H01J 3/04 (2006.01) H01J 27/14 (2006.01) H01J 37/08 (2006.01)

Patent

CA 2162748

An ion source (12) embodying the present invention is for use in an ion implanter (10). The ion source comprises a gas confinement chamber (76) having conductive chamber walls that bound a gas ionization zone. The gas confinement chamber includes an exit opening (78) to allow ions to exit the chamber. A base (120) positions the gas confinement chamber relative to structure for forming an ion beam from ions exiting the gas confinement chamber. A gas supply is in communication with the gas confinement chamber for conducing an ionizable gas into the gas confinement chamber. A cathode (124) is supported by the base and positioned with respect to said gas confinement chamber to emit ionizaing electrons into the gas ionization zone. The cathode comprises a tubular conductive body (160, 162) that partially extends into the gas confinement chamber and includes a conductive cap (164) that faces into the gas confinement chamber for emitting ionizaing electrons into the gas confinement chamber. A filament (178) is supported by the base (120) at a position inside the tubular conductive body of the cathode for heating the cap and cause the ionizing electrons to be emitted from the cap into the gas confinement chamber.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Ion generating source for use in an ion implanter does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Ion generating source for use in an ion implanter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ion generating source for use in an ion implanter will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1870450

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.