H - Electricity – 01 – J
Patent
H - Electricity
01
J
356/176
H01J 37/244 (2006.01) H01J 37/02 (2006.01)
Patent
CA 1089113
ION IMPLANTATION APPARATUS FOR CONTROLLING THE SURFACE POTENTIAL OF A TARGET SURFACE Abstract of the Disclosure In an ion beam apparatus a structure for controlling the surface potential of the target comprising an electron source adjacent to the beam for providing electrons to the beam and means between the target and source for inhibiting rectilinear radiations, i.e., electron and other particle and photon radiations between said source and said target. This prevents heating of the target by the electron source and cross-contamination between the source and the target. A further structure is provided for the measurement of the ion beam current while controlling said surface potential of the target which includes: walls adjacent to and elec- trically insulated from the target and surrounding the beam whereby the walls and target provide a Faraday Cage, means for introducing variable quantities or electrons into the beam within the Faraday Cage, means for measuring the target current, means for combining and measuring the target and wall currents to provide said ion beam current measurement and means for varying the quantities of intro- duced electrons to control the target current and thereby the target surface potential.
298328
Forneris John L.
Hicks William W.
Keller John H.
Mckenna Charles M.
Seirmarco James A.
International Business Machines Corporation
Na
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